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HFE 7200 Cas 163702 06 5 for Semiconductor Cleaning Tel：+86-592-5803997

As a next-generation fluorinated solvent, HFE 7200 sets the benchmark for precision cleaning in environments where absolute reliability is non-negotiable. Engineered with ultra-high purity, exceptional material compatibility, and rapid residue-free evaporation, it addresses the most demanding cleaning challenges across semiconductor manufacturing, optics, electronics, and medical instrumentation.

Semiconductor Cleaning: From removing nano-scale etch residues on wafer substrates to delicately cleansing sensitive optical lenses and medical endoscopes, HFE 7200 delivers consistent, repeatable performance without compromising substrate integrity. Its non-flammable nature and low toxicity make it a safe choice for both automated vapor degreasing systems and manual cleaning processes, while its environmental profile aligns with global sustainability directives.

Where conventional solvents fall short, HFE 7200 excels - ensuring critical components meet the highest standards of cleanliness, functionality, and longevity.

Key Applications of HFE 7200 Tel：+86-592-5803997

1. Wet Cleaning of Semiconductor Etching Equipment; Cleaning of Liquid Crystal and Hard Disk Components
HFE 7200 is extensively utilized in advanced wet cleaning processes for semiconductor fabrication, particularly in post-etch residue removal from wafers and chamber components. Its exceptional purity, low surface tension, and rapid evaporation ensure thorough cleaning without leaving ionic or particulate contaminants. In the display and data storage industries, it is equally effective for cleaning delicate liquid crystal display (LCD) panels and hard disk drive (HDD) components, preserving optical clarity and mechanical precision while eliminating oils, particles, and organic residues.

2. Laser Equipment Cleaning and Optical Lens Cleaning
Due to its non-corrosive and residue-free properties, HFE 7200 is ideal for maintaining high-performance optical systems. It safely removes dust, fingerprints, and coatings from laser optics, lenses, mirrors, and sensors without damaging anti-reflective or specialized coatings. Its fast-drying nature prevents streaking, ensuring optimal light transmission and system accuracy in critical applications such as lithography, laser cutting, medical imaging, and scientific instrumentation.

3. Cleaning of Precision Electronic Components
HFE 7200 serves as a highly reliable solvent for degreasing and flux removal from sensitive electronic assemblies, including printed circuit boards (PCBs), connectors, relays, and microelectromechanical systems (MEMS). Its low toxicity and superior material compatibility allow for safe use on plastics, elastomers, and metals, preventing swelling, cracking, or electrical degradation while ensuring high dielectric reliability.

4. Aviation and Medical Fields (Medical Lens Cleaning, Special Sensitive Materials)
In aviation, HFE 7200 is used to clean avionics, navigation systems, and sensitive composite materials without affecting their structural or electrical properties. In medical device manufacturing and maintenance, it is applied for cleaning endoscope lenses, surgical tooling, diagnostic sensors, and other biocompatible components, where sterility, non-reactivity, and zero residue are paramount.

5. Beauty and Cosmetics Applications (Makeup/Makeup Remover, Facial Masks)
In cosmetic formulations, HFE 7200 acts as a volatile carrier or solvent in products such as long-wear makeup, waterproof makeup removers, and sheet masks. Its gentle, non-irritating characteristics and rapid evaporation help deliver active ingredients evenly without leaving a greasy residue, enhancing user experience and product stability.

6. Cleaning and Rinsing Agents for Vapor Degreasing
HFE 7200 is a preferred solvent in closed-loop vapor degreasing systems for removing oils, greases, and waxes from metal, ceramic, and polymer parts. Its low boiling point and high stability allow for efficient condensation and recovery, minimizing solvent consumption and environmental impact while achieving industrial-grade cleanliness.

7. Lubricant Carrier
As a carrier fluid in specialty lubricants and anti-seize compounds, HFE 7200 facilitates the even application of lubricating particles or additives to complex mechanical assemblies. It evaporates quickly after application, leaving behind a uniform, thin lubricating film without attracting dust or interfering with tolerances.

8. Specialized Solvent, Dispersion Medium, Reaction Medium, and Extraction Solvent
HFE 7200 is employed in R&D and high-value chemical processes as an inert medium for dispersing nanomaterials, conducting controlled chemical reactions, or extracting sensitive compounds. Its chemical stability, non-polarity, and low reactivity make it suitable for handling advanced materials, pharmaceuticals, and fine chemicals.

9. Replacement for CFCs, HCFCs, HFCs, and PFCs
As an environmentally responsible alternative to ozone-depleting and high-global-warming-potential (GWP) solvents, HFE 7200 offers comparable or superior performance with zero ozone depletion potential (ODP) and a significantly lower GWP. It supports compliance with international environmental regulations such as the Montreal and Kyoto Protocols.

10. Heat Transfer Fluid
HFE 7200 is used in single-phase or two-phase cooling systems for electronics, laser systems, and laboratory equipment. Its thermal stability, non-flammability, and dielectric properties enable efficient and safe heat dissipation in direct-contact or indirect cooling applications, including immersion cooling for high-performance computing and power electronics.

hFE 7200 Data sheet Tel：+86-592-5803997

Appearance and Properties	Colorless transparent liquid	Odor	Odorless
Boiling point at 1atm	156-160℃	Freezing point	-84.9 ℃

density of liquid(25℃)	1.810 g·mL^-1	Flash Point	No

dielectric loss(10 MHz)	0.00418	volume resistivity	≥1.579×1011 Ω·mm
refractive index	1.308	coefficient of volume expansion(20-80 ℃)	5.420×10^-3

kinematic viscosity(25℃)	3.05 mm2·s^-1	Specific Heat	1.151 J·g^-1·K^-1

heat conductivity coefficient(25 ℃)	0.0656W∙m-1∙K^-1	surface tension	17.51 mN·m^-1

dielectric strength(2.5 mm)	＞50.4 kV	dielectric constant(1 MHz)	4.75

ODP	0	GWP	180