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HFE-7200 (CAS 163702-06-5) for semiconductor cleaning

HFE-7200 (CAS 163702-06-5) for semiconductor cleaning

Replacement for NOVEC HFE 7200
Key benefits:
1. Low surface tension; low heat of vaporization;
2. Excellent material compatibility; moderate solubility;
3. Excellent electrical insulation performance;
4. Excellent thermal conductivity, thermal stability, and chemical stability;
5. Low viscosity; minimal viscosity change at low temperatures;
6. Dries and removes moisture without leaving water marks;

Description

Xiamen Juda Chemical & Equipment Co., Ltd. is one of the leading manufacturers and suppliers of HFE-7200 (CAS 163702-06-5) for semiconductor cleaning in China. If you are looking for HFE-7200 (CAS 163702-06-5) for semiconductor cleaning, please be free to buy our quality products at competitive price from our factory. Contact us for quotation.

 

HFE-7200 (CAS 163702-06-5) for Semiconductor Cleaning Tel:+86-592-5803997

As a next-generation fluorinated solvent, HFE 7200 sets the benchmark for precision cleaning in environments where absolute reliability is non-negotiable. Engineered for ultra-high purity, exceptional material compatibility, and rapid, residue-free evaporation, it addresses the most demanding cleaning challenges in semiconductor manufacturing, optics, electronics, and medical instrumentation.

 

Semiconductor cleaning: from removing nanoscale etch residues on wafer substrates to the delicate cleaning of sensitive optical lenses and medical endoscopes, HFE 7200 delivers consistent, repeatable performance without compromising substrate integrity. Its non-flammable nature and low toxicity make it a safe choice for both automated vapor degreasing systems and manual cleaning processes, while its environmental profile aligns with global sustainability directives.

 

Where conventional solvents fall short, HFE 7200 excels-ensuring that critical components meet the highest standards of cleanliness, functionality, and longevity.

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Key Applications of HFE-7200 Tel:+86-592-5803997

 

1. Wet cleaning of semiconductor etching equipment; cleaning of liquid crystal and hard disk components.

HFE 7200 is widely used in advanced wet cleaning processes for semiconductor manufacturing, particularly for removing post-etch residues from wafers and chamber components. Its exceptional purity, low surface tension, and rapid evaporation ensure thorough cleaning without leaving behind ionic contaminants or particles. In the display and data storage industries, it is equally effective for cleaning delicate liquid crystal display (LCD) panels and hard disk drive (HDD) components, preserving optical clarity and mechanical precision while removing oils, particles, and organic residues.

 

2. Laser equipment cleaning and optical lens cleaning.

Due to its non-corrosive and residue-free properties, HFE 7200 is ideal for maintaining high-performance optical systems. It safely removes dust and fingerprints from optics, lenses, mirrors, and laser sensors without damaging anti-reflective or specialized coatings. Its fast-drying nature prevents streaking, ensuring optimal light transmission and system precision in critical applications such as lithography, laser cutting, medical imaging, and scientific instrumentation.

 

3. Cleaning of precision electronic components.

HFE 7200 serves as a highly reliable solvent for degreasing and removing flux from sensitive electronic assemblies, including printed circuit boards (PCBs), connectors, relays, and micro-electromechanical systems (MEMS). Its low toxicity and superior material compatibility allow for safe use on plastics, elastomers, and metals, preventing swelling, cracking, or electrical degradation while ensuring high dielectric reliability.

 

4. Medical and aviation fields (cleaning medical lenses, special sensitive materials).

In aviation, HFE 7200 is used to clean avionics, navigation systems, and sensitive composite materials without affecting their structural or electrical properties. In the manufacturing and maintenance of medical devices, it is applied to clean endoscope lenses, surgical instruments, diagnostic sensors, and other biocompatible components, where sterility, non-reactivity, and zero residue are paramount.

 

5.Beauty and Cosmetic Applications (Makeup/Makeup Remover, Face Masks)
In cosmetic formulations, HFE 7200 acts as a volatile carrier or solvent in products such as long-lasting makeup, waterproof makeup removers, and masks. Its mild, non-irritating nature and rapid evaporation help distribute active ingredients evenly without leaving a greasy residue, thereby enhancing the user experience and product stability.

 

6. Cleaning and rinsing agents for steam degreasing
HFE 7200 is a preferred solvent for closed-loop vapor degreasing systems used to remove oils, greases, and waxes from metal, ceramic, and polymer parts. Its low boiling point and high stability enable efficient condensation and recovery, minimizing solvent consumption and environmental impact while achieving industrial-grade cleaning.

 

7. Lubricant carrier
As a carrier fluid in specialty lubricants and anti-seize compounds, HFE 7200 facilitates the uniform application of lubricating particles or additives to complex mechanical assemblies. It evaporates rapidly after application, leaving a thin, uniform lubricating film without attracting dust or interfering with tolerances.

 

8.Specialized solvent, dispersion medium, reaction medium, and extraction solvent

HFE 7200 is used in research and development and in high-value chemical processes as an inert medium for dispersing nanomaterials, conducting controlled chemical reactions, or extracting sensitive compounds. Its chemical stability, non-polarity, and low reactivity make it suitable for handling advanced materials, pharmaceuticals, and fine chemicals.

 

9. Replacement of CFCs, HCFCs, HFCs, and PFCs

As an environmentally responsible alternative to ozone-depleting solvents with high global warming potential, HFE 7200 offers comparable or superior performance with zero ozone depletion potential (ODP) and significantly lower GWP. It supports compliance with international environmental regulations such as the Montreal and Kyoto Protocols.

 

10. Heat transfer fluid

HFE 7200 is used in single-phase or two-phase cooling systems for electronics, laser systems, and laboratory equipment. Its thermal stability, non-flammability, and dielectric properties enable efficient and safe heat dissipation in direct or indirect contact cooling applications, including immersion cooling for high-performance computing and power electronics.

HFE 7200 Data Sheet Tel:+86-592-5803997
Appearance and Properties Colorless, transparent
liquid
Odor Odorless
Boiling point at 1 atm 156-160 degrees Freezing point

--84.9 degrees

Liquid density (25 degrees)

1.810 g·mL-1

Flash point

No

Dielectric loss (10 MHz)

0.00418

Volume resistivity

Greater than or equal to 1.579 x 10" Ω·mm

Refractive index

1.308

Volume expansion coefficient (20-80 degrees)

5.420×10-3

Kinematic viscosity (25 degrees)

3,05 mm2·s-1

Specific heat

1.151 J·g-1·K-1

Thermal conductivity coefficient (25 degrees)

0.0656W∙m-1∙K-1

Surface tension

17,51 mN·m-1

Dielectric strength (2.5 mm)

>50,4 kilovoltios

Dielectric constant (1 MHz)

4.75

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