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Hydrofluoroether HFE347 Wafer Cleaning Solvent

Hydrofluoroether HFE347, combining zero ODP, low GWP, non-flammability and zero residue, has quickly become the fab engineer's new favorite and is now regarded as a powerful complement and upgrade to conventional methods.

CAS NO: 406-78-0
ODP:0
GWP:≈350

Description

Xiamen Juda Chemical & Equipment Co., Ltd. is one of the leading manufacturers and suppliers of hydrofluoroether hfe347 wafer cleaning solvent in China. If you are looking for hydrofluoroether hfe347 wafer cleaning solvent, please be free to buy our quality products at competitive price from our factory. Contact us for quotation.

 

What is Wafer Cleaning? Tel:+86-592-5803997

Wafer cleaning is a crucial semiconductor process removing particles, organics, and metal contaminants from silicon wafers using wet chemical baths (like RCA Clean, Piranha etch with H₂SO₄/H₂O₂), solvents (acetone, methanol), hydrofluoric acid (HF), and mechanical scrubbing or megasonic methods, followed by ultra-pure water rinses and nitrogen drying to ensure defect-free surfaces for microchip fabrication, with processes evolving from batch dipping to single-wafer spraying for precision.

 

Hydrofluoroether HFE347, combining zero ODP, low GWP, non-flammability and zero residue, has quickly become the fab engineer's new favorite and is now regarded as a powerful complement and upgrade to conventional methods.

semiconductor cleaning
wafer cleaning process Tel:+86-592-5803997
Wafer Cleaning Step Purpose
Pre-Diffusion Clean Creates a surface that is free from metallic, particulate, and organic contaminants. In some instances, native oxide or chemical oxides need to be removed.
Metallic Ion Removal Clean Eliminate metallic ions, which can have detrimental effects on device operation.
Particle Removal Clean Remove particles from the surface using chemical or mechanical scrubbing using Megasonic cleaning.
Post Etch Clean Remove the photoresist and polymers left after the etching process. Remove photoresist and solid residue, including "etch polymer."
Film Removal Clean Silicon nitride etching/strip, Oxide etching/strip, Silicon etching, and metal etching/strip
The Limits Of Conventional Cleaning & HFE's Strategic Role Tel:+86-592-5803997

The classic RCA wafer cleaning process relies on high-temperature, high-purity aqueous chemical solutions (e.g., SC-1, SC-2). While excellent at removing ions, metallic contaminants, and particles, the process has two inherent limitations:

 

Limited efficacy against specific organic contaminants such as photoresist residues, vacuum pump oils, silicone greases, and advanced lubricants from precision components.

The "water" drying challenge: Water's high surface tension poses a critical risk during the final drying phase, often leading to pattern collapse and watermark residues, especially on high-aspect-ratio structures.

 

HFE 347, as an advanced hydrofluoroether solvent, addresses these pain points directly through its unique physicochemical properties, positioning itself as the ideal medium for "precision dry-in-wet cleaning."

Basic Information Of wafer cleaning Hydrofluoroether HFE347
Tel:+86-592-5803997

HFE (Hydrofluoroether) is a class of organic compounds composed of hydrogen, fluorine, carbon and oxygen, combining ether bonds (R-O-R') and fluoroalkyl structures. It is designed to retain the excellent performance of fluorinated solvents while reducing environmental impacts (such as ozone layer depletion and global warming potential). HFE is widely used as a precision cleaning agent, coolant, solvent carrier, etc., especially in the electronics, semiconductor and aerospace fields.

 

Chemical Name:

1,1,2,2-Tetrafluoroethyl 2,2,2-trifluoroethyl ether

CAS:

406-78-0

MF:

C4H3F7O

MW:

200.05

EINECS:

609-858-6

Chemical Properties

Boiling point

56.2 °C

density

1.487

refractive index

1.276

Specific Gravity

1.487

CAS DataBase Reference

406-78-0(CAS DataBase Reference)

EPA Substance Registry System

HFE-347pcf2 (406-78-0)

Test items

Specifications

Appearance

Clear colorless liquid

Purity

≥99.5%

Water

≤100ppm

semiconductor wafer cleaning HFE 347 Factory Tour  Tel:+86-592-5803997
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semiconductor Cleaning supplier - Company Profile Tel:+86-592-5803997

 

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Xiamen Juda Chemical & Equipment Co., Ltd. is a strategic enterprise invested by Juhua Group - a leader in China's fluorochemical industry - to advance into the high-end electronic materials sector.

 

Building on the Group's full industrial chain strengths, spanning from fundamental fluorine feedstocks to advanced fluoropolymers, and drawing upon its long-term technology expertise, Juda aims to overcome international supply barriers and attain self-sufficiency in core electronic materials. The company specializes in delivering essential high-performance fluorine-based solutions for the production of semiconductors, integrated circuits, and other sophisticated electronic applications.

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